News Article
IMEC Builds 300mm Cleanroom
IMECs board of directors announced the construction of a new 300mm cleanroom based on a detailed engineering study made in 2002 and positive signals of industry and local government support. Construction of the new 2200m2 research fab will begin in February 2003, with completion due in 18 months.
IMECs board of directors announced the construction of a new 300mm cleanroom based on a detailed engineering study made in 2002 and positive signals of industry and local government support. Construction of the new 2200m2 research fab will begin in February 2003, with completion due in 18 months.
The facility is expected to go on-line in mid 2005, with activities gradually ramping up. The initiative involves an investment of EUR84mn of which EUR37mn has been granted by local government. The new fab will be located adjacent to IMECs existing facilities.
Several IMEC research programmes will be set up to target the most important issues identified by the International Technology Roadmap for Semiconductors for the sub-45nm node. The focus will be EUV lithography, new materials, advanced devices and innovative interconnect schemes. The programmes will be open to semiconductor companies and material and equipment suppliers worldwide.