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SELETE Buys Characterisation Tool For 65nm In 2004

Friday 17th January 2003

Japans Semiconductor Leading Edge Technology Consortium (SELETE) will take delivery of n&k Technologys 3300 Analyzer system for 300mm wafers.
Japans Semiconductor Leading Edge Technology Consortium (SELETE) will take delivery of n&k Technologys 3300 Analyzer system for 300mm wafers.


. The systems will be used for front-end of line process development, including characterisation of high-k gate dielectrics and novel gate electrodes, as well as for the back-end of line process characterisation involving low-k inter-layer dielectric (ILD) materials and thin barrier metals.


SELETEs target is to develop 65nm technology using a high-k gate dielectric and multilevel interconnects using low-k ILD materials by 2004.

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